无序代表的化学意义4

DJ_Tokyo

相关软件或概念：Olex2[1] (Version: Olex2-1.5); PLATON[2] (Version: 60124); SHELXL[3] (Version: SHELXL-2019/3); CIF[4]; Mercury[5](Version: Mercury 2023.2.0 (build 382240))

最近，陕西某高校友友求助处理一个晶体数据，对其中与金属配位的四氢呋喃做了特殊无序处理（PART -110.5），如图1所示。

▲图1 特殊无序处理的四氢呋喃

用Mercury查看对称元素，可知该四氢呋喃处于反演中心，如图2所示。

▲图2 四氢呋喃所处位置的对称元素

个人理解该结构为如图3所示的A和B的1:1共晶。

▲图3 结构表述（不对称单元）

造成该四氢呋喃特殊无序的原因可能是晶体中A和B按照类似如图4所示方式排列。

▲图4 结构排列

参考文献

[1]Dolomanov, O. V.; Bourhis, L. J.; Gildea, R. J.; Howard, J. A. K.; Puschmann,H. OLEX2: A complete structure solution,refinement and **ysis program. J. Appl. Cryst. 2009, 42, 339–341.

[2] (a) Spek, A. L. Single-crystal structure validationwith the program PLATON. J. Appl.Cryst. 2003, 36, 7–13. (b) Spek,A. L. Structure validation in chemical crystallography. Acta Cryst. 2009, D65, 148–155. (c) Spek, A. L. What makes a crystal structure reportvalid? Inorg. Chim. Acta 2018, 470, 232–237. (d) Spek, A. L. checkCIFvalidation ALERTS: what they mean and how to respond. Acta Cryst. 2020, E76, 1–11.

[3](a) Sheldrick, G. M. SHELXL-2019/2, Program for Crystal Structure Refinement,University of Göttingen, Germany, 2019. (b) Sheldrick, G. M. A short history ofSHELX. Acta Cryst. 2008, A64, 112–122. (c) Sheldrick, G. M.Crystal structure refinement with SHELXL.Acta Cryst. 2015, C71, 3–8. (d)Lübben, J.; Wandtke, C. M.; Hübschle, C. B.; Ruf, M.; Sheldrick, G. M.;Dittrich, B. Aspherical scattering factors for SHELXL – model, implementation and application. Acta Cryst. 2019, A75, 50–62.

[4](a) Hall, S. R.; Allen, F. H. Brown, I. D. The Crystallographic InformationFile (CIF): a New Standard Archive File for Crystallography. Acta Cryst. 1991, A47, 655–685. (b)Hall, S. R. The STAR File: A New Format for Electronic Data Transfer andArchiving. J. Chem. Inf. Comput. Sci.1991, 31, 326–333. (c) Hall, S. R.; Spadaccini, N. The STAR File:Detailed Specifications. J. Chem. Inf.Comput. Sci. 1994, 34, 505–508.

[5]Macrae, C. F., Edgington, P. R., McCabe, P., Pidcock, E., Shields, G. P.,Taylor, R., Towler, M. & van de Streek, J. J. Appl. Cryst. 2006, 39, 453-457.

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