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[审稿意见] 溶剂遮掩带来的麻烦事(审稿意见)

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发表于 2025-8-20 07:54:19 | 查看全部 |阅读模式
溶剂遮掩带来的麻烦事(审稿意见)
案例来源:CCDC[1] 2067413‒2067415. New J. Chem. 2022, 46, 2465–2471. DOI[2]: 10.1039/d1nj05548h.
案例结构如1所示(由ChemBioDraw[3]绘制)。
1 案例结构
审稿意见如下:
  
审稿意见
  
大意
**complex_5** (CCDC 2067415)
  
-- A solvent mask has been used, and it has  found 50 electrons in 185A^3. What was masked? This is most probably THF --  but that requires only 40 electrons, and we've got 50! I strongly suspect  that there is a water molecule in there as well (there is evidence of this  from the residual density map -- also for some of the other structures in  this set!).
  
This will lead to this information ...
**complex_5** (CCDC 2067415)
  
该数据适用了溶剂遮掩,并且在185立方埃中找到50个电子。遮掩掉了什么?这最有可能是四氢呋喃——但它仅需40个电子,但此处找到50个!我强烈怀疑这里也存在一个水分子(残余密度图也有证据表明这一点——这组中的其他结构同样如此!)。
  
  
这将产生以下信息。。。
_chemical_formula_moiety 'C43 H58 Cl2 N3 O3 Yb,1[C4H8O], 1[H2O]'
_chemical_formula_sum 'C47 H68 Cl2 N3 O5 Yb'
_chemical_formula_weight 998.98
  
... which is uncountably more informative and  correct than your current:
  
这比你目前的信息量和正确性都要多得多
_chemical_formula_moiety 'C43 H58 Cl2 N3 O3 Yb'
_chemical_formula_sum 'C43 H58 Cl2 N3 O3 Yb'
_chemical_formula_weight 908.86
  
Author responds: Actually, the complex is synthesized under  strict anhydrous and oxygen free conditions, and it is impossible to contain  water. In the revised CIF, there was no solvent  mask used and the residual densities were modelled as a disordered THF,  resulting a reasonable max peak of 0.6.
  
作者回应:事实上,该配合物是在严格的无水无氧条件下合成的,不可能含水。在修订的CIF中,没有使用溶剂遮掩,残余密度被建模为无序的四氢呋喃,最终得到合理的最大残余峰为0.6
  
**complex_4** (CCDC 2067414), **20190303a**  (CCDC 2067413)
  
The same comments regarding the solvent mask  that was made elsewhere applies here.
  
**complex_4** (CCDC 2067414), **20190303a**  (CCDC 2067413)
  
其他地方对溶剂遮掩的评论也适用于此。
Author responds: In the revised CIF (complex3, CCDC 2067413 and  complex4, CCDC 2067414), there was no solvent  mask used and the residual densities were modelled as a disordered THF.
作者回应:在修订的CIFcomplex3, CCDC 2067413complex4, CCDC 2067414)中,没有使用溶剂遮掩,残余密度被建模为无序的四氢呋喃。
对于CCDC 2067415,用Olex2[4]中的Solvent Mask[5]将主体结构之外的结构部分遮掩掉,则在176立方埃体积中找出49个电子,1个四氢呋喃的电子数是40个,多出来9个电子可对应于1个水分子,1个水分子的电子数是10个,而使用PLATON[6]SQUEEZE[7]将主体结构之外的结构部分挤压掉,则在160立方埃的体积中找到42个电子,如2所示,较为符合1个四氢呋喃。(Solvent MaskSQUEEZE算法不同,因此遮掩/挤压后计算得到的电子数/体积不同。)
2 Olex2/Solvent MaskPLATON/SQUEEZE结果
上述溶剂遮掩/挤压后Max Peak0.5,而把溶剂建模出来(此处为四氢呋喃)后Max Peak0.6,相差无几,也是非常合理的,如3所示。
3 建模好溶剂的结果
视频讲解请参阅:
溶剂遮掩带来的麻烦事(审稿意见)https://www.bilibili.com/video/BV1KqfBYuE4c
参考文献
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声明:本文仅代表个人观点,笔者学识有限,资料整理过程中可能存在疏漏错误,请不吝指正。
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